Neural Networks

• Michael D. Baker, Christopher D. Himmel, and Gary S. May, "Time Series Modeling of Reactive Ion Etching Using Neural Networks", IEEE Transactions on Semiconductor Manufacturing, Vol. 8, No. 1, February 1995, pp. 62-71.
• Gunhan Dundar and Kenneth Rose, "Comparing Models for the Growth of Silicon-Rich Oxide (SRO)", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 1, February 1996, pp. 74-81.
• Seung-Soo Han and Gary S. May, "Using Neural Network Process Models to Perform PECVD Silicon Dioxide Recipe Synthesis via Genetic Algorithms", IEEE Transactions on Semiconductor Manufacturing, Vol. 10, No. 2, May 1997, pp. 279-287.
• Seung-Soo Han, Li Cai, Gary S. May, and Ajeet Rohatgi, "Modeling the Growth of PECVD Silicon Nitride Films for Solar Cell Applications Using Neural Networks", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 3, August 1996, pp. 303-311.
• Christopher D. Himmel and Gary S. May, "Advantages of Plasma Etch Modeling Using Neural Networks Over Statistical Techniques", IEEE Transactions on Semiconductor Manufacturing, Vol. 6, No. 2, May 1993, pp. 103-111.
• Byungwhan Kim and Gary S. May, "Real-Time Diagnosis of Semiconductor Manufacturing Equipment Using a Hybrid Neural Network Expert System", IEEE Transactions on Components, Packaging, and Manufacturing Technology --Part C, Vol. 20, No. 1, January 1997, pp. 39-47.
• Byungwhan Kim and Gary S. May, "An Optimal Neural Network Process Model for Plasma Etching", IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 1, February 1994, pp. 12-21. < li> Sherry F. Lee and Costas J. Spanos, "Prediction of Wafer State After Plasma Processing Using Real-Time Tool Dta", IEEE Transactions on Semiconductor Manufacturing, Vol. 8, No. 3, August 1995, pp. 252-261.
• Ziba Nami, Ozgur Misman, Ahmet Erbil, and Gary S. May, "Semi-Empirical Neural Network Modeling of Metal-Organic Chemical Vapor Deposition", IEEE Transactions on Semiconductor Manufacturing, Vol. 10, No. 2, May 1997, pp. 288-294.
• Nadi, et. al. "Use of Influence Diagrams and Neural Networks in Modeling Semiconductor Manufacturing Processes."
• Edward A. Rietman, "A Neural Network Model of a Contact Plasma Etch Process for VLSI Production", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 1, February 1996, pp. 95-100.
• Edward A. Rietman and Earl R. Lory, "Use of Neural Networks in Modeling Semiconductor Manufacturing Processes: An Example for Plasma Etch Modeling", IEEE Transactions on Semiconductor Manufacturing, Vol. 6, No. 4, November 1993, pp. 343-347.
• Taber H. Smith and Duane S. Boning, "A Self-Tuning EWMA Controller Utilizing Artificial Neural Network Function Approximation Techniques", IEEE Transactions on Components, Packaging, and Manufacturing Technology --Part C, Vol. 20, No. 2, April 1997, pp. 121-132.

Fuzzy Logic

• Jian Tan, Hong Xie, and Yung-Cheng Lee, "Efficient Establishment of a Fuzzy Logic Model for Process Modeling and Control", IEEE Transactions on Semiconductor Manufacturing, Vol. 8, No. 1, February 1995, pp. 50-61.
• Ram K. Ramamurthi, "Self-Learning Fuzzy Logic System for In Situ, In-Process Diagnostics of a Mass Flow Controller (MFC)", IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 1, February 1994, pp. 42-52.
• Hong Xie, R.L. Mahajan, and Yung-Cheng Lee, "Fuzzy Logic Models for Thermally Based Microelectronic Manufacturing Processes", IEEE Transactions on Semiconductor Manufacturing, Vol. 8, No. 3, August 1995, pp. 219-227.

Expert Systems

• Steven B. Dolins, Aditya Srivastava, and Bruce E. Flinchbaugh, "Monitoring and Diagnosis of Plasma Etch Processes", IEEE Transactions on Semiconductor Manufacturing, Vol. 1, No. 1, February 1988, pp. 23-27.
• Rafael A. Perez and Song W. Koh, "Integrating Expert Systems With a Relational Database in Semiconductor Manufacturing", IEEE Transactions on Semiconductor Manufacturing, Vol. 6, No. 3, August 1993, pp. 199-206.
• Purag Rastogi, Michael N. Kozicki, and F. Golshani, "ExPro--An Expert System Based Process Management System", IEEE Transactions on Semiconductor Manufacturing, Vol. 6, No. 3, August 1993, pp. 207-218.
• Jim A. Walls, Anthony J. Walton, and J.M. Robertson, "Interpretation and Control of C-V Measurements Using Pattern Recognition and Expert System Techniques", IEEE Transactions on Semiconductor Manufacturing, Vol. 4, No. 3, August 1991, pp. 250-262.

Genetic Algorithms

• Seung-Soo Han and Gary S. May, "Using Neural Network Process Models to Perform PECVD Silicon Dioxide Recipe Synthesis via Genetic Algorithms", IEEE Transactions on Semiconductor Manufacturing, Vol. 10, No. 2, May 1997, pp. 279-287.
• Edward A. Reitman and Robert C. Frye, "A Genetic Algorithm for Low Variance Control in Semiconductor Device Manufacturing: Some Early Results", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 2, May 1996, pp. 223-229.