Topics in Technological Statistics: Process Control

Process Control

Go to list of abstracts for these articles.

Abugov, Robert. "From Trend Charts to Control Charts: Setup Tests for Making the Leap." IEEE Transactions on Semiconductor Manufacturing, vol. 6, no. 2, p. 184-188, May 1993.
Bushman, Scott, Thomas F. Edgar, and Isaac Trachtenberg. "Modeling of Plasma Etch Systems Using Ordinary Least Squares, Recurrent Neural Network, and Projection to latent Structure Models." Journal of the Electrochemical Society, vol. 144, no. 4, p. 1379-1389, April 1997.
Calvin, Thomas W., "Quality Control techniques for Zero Defects", IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. chmt-6, no. 3, p. 323-328, September 1983.
David A. Hanson, Ronald J. G. Goossens, Mark Redford, Jim McGinty, John K. Kibarian, and Kimon W. Michaels, "Analysis of Mixed-Signal Manufacturability with Statistical Technology CAD (TCAD)", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 4, November 1996, pp. 478-488.
Knight, Thomas J., David W. Greve, Xu Cheng, and Bruce H. Krogh. "Real Time Multivariable Control of PECVD Silicon Nitride Film Properties." IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 1, p. 137-146, February 1997.
Leang, Sovarong and Costas J. Spanos. "A General Equipment Diagnostic System and its Application on Photolithographic Sequences." IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 3, p. 329-343, August 1997.
Lee, Sherry F., Eric D. Boskin, Hao Cheng Liu, Eddie H. Wen, and Costas J. Spanos. "RTSPC: A Software Utility for Real-Time SPC and Tool Data Analysis." IEEE Transactions on Semiconductor Manufacturing, vol. 8, no. 1, p. 17-25, February 1995.
Mozumder, Purnendu K. and Andrzej J. Strojwas. "Statistical Control of VLSI Fabrication Processes." IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. 14, no. 3, p. 467-475, September 1991.
Mozumder, Purnendu K., C.R. Shyamsundar, and Andrzej J. Strojwas. "Statistical Control of VLSI Fabrication Processes: A Framework." IEEE Transactions on Semiconductor Manufacturing, vol 1., no. 2, p. 62-71, May 1988.
Rao, Suraj, Andrej J. Strojwas, John P. Lehoczky, and Mark J. Schervish. "Monitoring Multistage Integrated Circuit Fabrication Processes." IEEE Transactions on Semiconductor Manufacturing, vol. 9, no. 4, p. 495- 505, November 1996.
Rietman, Edward A. and Suresh H. Patel. "A Production Demonstration of Wafer-to-Wafer Plasma Gate Etch Control by Adaptive Real-Time Computation of the Over-Etch Time from in Situ Process Signals." IEEE Transactions on Semiconductor Manufacturing, vol. 8, no. 3, p. 304-308, August 1995.
Scher, Gary, Dennis H. Eaton, Barry R. Fernelius, James Sorensen, and Jerry W. Akers. "In-Line Statistical Process Control and Feedback for VLSI Integrated Circuit Manufacturing." IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. 13, no. 3, p. 484-489, September 1990.
Shyamsundar, C.R. Purnendu K. Mozumder, and Andrzej J. Strojwas. "Statistical Control of VLSI Fabrication Processes: A Software System." IEEE Transactions on Semiconductor Manufacturing, vol. 1, no. 2, p. 72- 82, May 1988.
Spanos, Costas J. and Raymond L. Chen. "Using Qualitative Observations for Process Tuning and Control." IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 2, p. 307-316, May 1997.
Spanos, Costa J.,Hai-Fang Guo, Alan Miller, and Joanne Levine-Parrill."Real Time Statistical Process Control Using Tool Data." IEEE Transactions on Semiconductor Manufacturing, vol. 5, no. 4, p. 308-318, November 1992.
Stefani, Jerry A., Scott Poarch, Sharad Saxena, and Purnendu K. Mozumder. "Advanced Process Control (APC) of a CVD Tungsten Reactor." IEEE Transactions on Semiconductor Manufacturing, vol. 9, no. 3, p. 366-383, August 1996.
Stefani, Jerry, Lee M. Loewenstein, and Michael Sullivan. "On-Line Diagnostic Monitoring of Photoresist Ashing." IEEE Transactions on Semiconductor Manufacturing, vol. 8, no. 1, p. 2-9, February 1995.

EPC concepts (engineering) -- Feed forward and feedback control

El-Awady, Khalid, Charles Schaper, and Thomas Kailath, "Improvements in Cpk Using Real-Time Feedback Control", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 1, February 1996, pp. 87-94.
Mozumder, Purnendu K. and Gabriel G. Barna. "Statistical Feedback Control of a Plasma Etch Process." IEEE Transactions on Semiconductor Manufacturing, vol 7, no. 1, p. 1-11, February 1994.
Rashap, Brian A., Michael E. Elta, Hossein Etemad, Jeffrey P. Fournier, James S. Freudenberg, Martin D. Giles, Jessy W. Grizzle, Pierre T. Kabamba, Pramod P. Khargonekar, Stephane Lafortune, James R. Moyne, Demosthenis Teneketzis, and Fred L. Terry, Jr. "Control of Semiconductor Manufacturing Equipment: Real-Time Feedback Control of a Reactive Ion Etcher." IEEE Transactions on Semiconductor Manufacturing, vol 8, no. 3, p. 286-297, August 1995.

Run to run control

Baras, John S. and Nital S. Patel, "A Framework for Robust Run by Run Control with Lot Delayed Measurements", IEEE Transactions on Semiconductor Manufacturing, vol 10, no. 1, February 1997.
Stephanie Watts Butler and Jerry Stefani, "Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In Situ Ellipsometry", IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 2, May 1994, pp. 193-201.
Del Castillo, Enrique and Arnon M. Hurwitz, "Run-to-Run Process Control: Literature Review and Extensions", Journal of Quality Technology, vol.29, no. 2, p. 184-196, April 1997.
Matt Hankinson, Tyrone Vincent, Keki B. Irani, and Pramod P. Khargonekar, "Integrated Real-Time and Run-to-Run Control of Etch Depth in Reactive Ion Etching", IEEE Transactions on Semiconductor Manufacturing, Vol. 10, No. 1, February 1997, pp. 121-130.
Minh S. Le, Taber H. Smith, Duane S. Boning, and Herbert H. Sawin, "Run-to-Run Control on a Dual-Coil Transformer Coupled Plasma Etcher with Full Wafer Inferometry and Spatially Resolved Optical Emission Spectroscopy", Electrochemical Society Proceedings, Vol. 97-9, pp. 3-10.
Leang, Sovarong, Shang-Yi Ma, John Thomson, Bart John Bombay, and Costas J. Spanos, "A Control System for Photolithographic Sequences", IEEE Transactions on Semiconductor Manufacturing, vol. 9, no. 2, p. 191-207, May 1996.
P.K. Mozumder, Sharad Saxena, and David J. Collins, "A Monitor Wafer based Controller for Semiconductor Processes", IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 3, August 1994, pp. 400-411.
Emanuel Sachs, Albert Hu, and Armann Ingolfsson, "Run by Run Process Control: Combining SPC and Feedback Control", IEEE Transactions on Semiconductor Manufacturing, Vol. 8, No. 1, February 1995, pp. 26-43.
Taber H. Smith, Duane S. Boning, Jerry Stefani, and Stephanie Watts Butler, "Run by Run Advanced Process Control of Metal Sputter Deposition", Electrochemical Society Proceedings, Vol. 97-9, pp. 11-18.

EWMA control

J. Stuart Hunter "The Exponentially Weighted Moving Average", Journal of Quality Technology, Vol. 18, No. 4, October 1986, pp. 203-210.
Armann Ingolfsson and Emanuel Sachs "Stability and Sensitivity of an EWMA Controller", Journal of Quality Technology, Vol. 25, No. 4, October 1993, pp. 271-287.
James M. Lucas and Michael S. Saccucci, "Exponentially Weighted Moving Average Control Schemes: Properties and Enhancements", Technometrics, Vol. 32, No. 1, February 1990, pp. 1-29.

Multistage control systems

Suraj Rao, Andrzej J. Strojwas, John P. Lehoczky, and Mark J. Schervish, "Monitoring Multistage Integrated Circuit Fabrication Processes", IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 4, November 1996, pp. 495-505.

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